Journal

[23] Gate Insulator Inhomogeneity in Thin Film Transistors Having a Polycrystalline Silicon Layer Prepared Directly by Catalytic Chemical Vapor Deposition at a Low Temperature

Author

Hyun-Jun Cho, Wan-Shick Hong*, Sung-Hyun Lee, Tae-Hwan Kim, Kyung-Min Lee, Kyung-Bae Park, Ji Sim Jung, and Jang-Yeon Kwon

Journal

Japanese Journal of Applied Physics
Jpn. J. Appl. Phys.

Vol / Page / Year

46 / L1228 / 2007

[22] Reliability Analysis of Ultra Low-Temperature Polycrystalline Silicon Thin-Film Transistors

Author

Hitoshi Ueno, Yuta Sugawara, Hiroshi Yano, Tomoaki Hatayama, Yukiharu Uraoka*, Takashi Fuyuki, Ji Sim Jung, Kyung Bae Park, Jong Man Kim, Jang-Yeon Kwon, and Takashi Noguchi

Journal

Japanese Journal of Applied Physics
Jpn. J. Appl. Phys.

Vol / Page / Year

46 / 1303 / 2007